Post-doc in Simulations of Thin Film Growth

Materials science and technology are our passion. With our cutting-edge research, Empa's around 1,100 employees make essential contributions to the well-being of society for a future worth living. Empa is a research institution of the ETH Domain.

Our Laboratory for Mechanics of Materials and Nanostructures is looking for a highly motivated candidate.

You will work on applied research and fundamental projects funded by InnoSuisse and the Swiss National Science Foundation on simulations of precursor transport, heat distribution, the nucleation, and growth of thin films in atomic layer deposition (ALD) reactors. The range of simulations focuses on finite element methods and can include Monte Carlo based simulation approaches and continuum modelling. Verification of simulation results against experimental findings will be part of your activities. You are expected to publish your research output in high-level peer-reviewed scientific journals.

You must hold a PhD in Physics, Chemistry, Material Science, Computational Science, or similar. A high level of motivation to work in close collaboration with industry, experimentalists and an international, multidisciplinary research team is essential. Experience in ALD and simulation techniques is desirable. Knowledge of English (oral and written) ist required and knowledge of German or French would be an advantge.

The Laboratory for Mechanics of Materials and Nanostructures of Empa in Thun offers an ideal working environment, with state-of-the art equipment (cleanrooms, high level materials analysis facilities, ALD/MLD/PVD infrastructure, and computation). The city is situated in a beautiful area near the mountains in the German-speaking part of Switzerland. 

We look forward to receiving your complete online application including a letter of motivation, CV, certificates, diplomas and contact details of two reference persons. Please submit these exclusively via our job portal. Applications by e-mail and by post will not be considered.